Spherical and Densified Tantalum Powder
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Tantalum has a high boiling point, good resistance to corrosion, low co-efficient of thermal expansion and high co-efficient of capacitance. This is why it is widely used in the electronic industries in the manufacture of sputtering targets and capacitors.
With its unique production technique, Tekna can offer spherical and densified Tantalum Powder having higher density, higher purity and better flow-ability than standard Tantalum powder.
Various size fractions are available from a few microns to several hundreds microns. Most typical size fractions are the following:
- -40+60 mesh (-420+250 um),
- -60+80 mesh (-250+180 um),
- -80+120 mesh (-180+125 um),
- -100+325 mesh (-150+44 um);
- -325 mesh (-44 um).
Size fraction can also be customized to meet customer’s technical criteria for specific application.
Please contact us for more information.



