Induction Plasma Systems
Our induction plasma laboratory units or industrial production units are available in the following configurations
Development Unit (TDU)
Tekna’s induction plasma development units offer considerable flexibility in the areas of powder treatment, nanopowder synthesis, coating and near net-shape deposition. These development units are available in different configurations, which can be supplied individually or in combination. The modular design permits the reactors to be easily removed from the plasma unit for cleaning and maintenance. This adds the flexibility of using dedicated equipment to avoid cross contamination and to assure powder purity. Each system can be designed with a single or a dual RF outlet to minimize reactor manipulation and provide switch over between different processes.
This package permits the exploration of a wide range of plasma operating conditions, as well as the ability to make quick adjustments to produce several variations of the material. The units are equipped with a user-friendly operating interface, allowing close monitoring and archiving of the process conditions.
Tekna offers two development systems:
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TDU-30
a 30 kw induction plasma system suitable for university and lab environments requiring high flexibility and low automation. |
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TDU-60
a 60 kW induction plasma system suitable for pilot plant production and industrial laboratories requiring flexibility, a high level of automation, and a good control of process conditions. |
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Industrial Units (TIU)
Tekna offers production systems with power levels from 60 kW, to 1 MW, which are customized to the each process. These systems are made for the demanding environment of industry. Our systems are specifically designed to meet our customers' needs, and incorporate a high level of automation and instrumentation to assure continuous operation 24/7.
Tekna offers different level of industrial systems.
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System Configurations
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Induction plasma can be used to synthesize nanomaterials from different precursors in either the powder, liquid, or gaseous state. The high temperature and high heat transfer environment makes it possible to evaporate nearly any material. The controlled and rapid quench gives rise to the formation of nano powders in the range of 20-100 nm. (more information on nanopowders)
The powder is evaporated in the induction plasma torch and allowed to resolidify rapidly as it passes through the quench zone. Tekna’s unique quenching zone permits the control of the nanoparticle size and the synthesis of the highest quality nanopowders.
The nanopowder synthesis chamber is a water-cooled, double wall, stainless steel construction, with an air lock to allow the continuous withdrawal of the processed powder without interruption in the operation of the system. The internal surface is highly polished for easy cleaning and to reduce memory effect and all types of contamination.
A heat exchanger, located between the powder processing chamber and the filter, cools the gas. The powder is separated from the flue gas in a nanopowder filtration system and then removed from the system via a removable cup located at the bottom of the unit. The filtration module system can also be equipped with a glove box for the safe manipulation of nanopowders.
As an option, we can manufacture the inner liner of the reactor in Inconel, or use a protective coating for better resistance to corrosive environments.
In summary:
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Reactor optimization for the synthesis of high grades nanopowders control particle size
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Highly polished internal surface
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High efficiency powder collecting device
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Safe handling of nanopowders in glove box
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Modular section for easy cleaning
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Safety relief pressure device
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Type of Material |
Exemples |
Typical Mean Diameter |
Precursor Type |
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Pure Metals |
All Metals
(Ag, Al, Cu, Fe, Mo, Ni, Re, Ta, Ti, W ...) |
20-75 nm |
Solid/Gas Phase |
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Oxides |
Al2O3, NiO, SiO2, TiO2,ZrO2 ... |
50-100 nm |
Solid/Liquid/Gas Phase |
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Carbides |
B4C, SiC, WC ... |
40-80 nm |
Solid/Liquid/Gas Phase |
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Nitrides |
TiN, BN, SiN4 ... |
20-80 nm |
Solid/Liquid/Gas Phase |
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Induction plasma technology is particularly suited for the plasma treatment process of powders because of the large volume of plasma, the axial feeding and the long particle residence time. In-flight melting of individual particles can create spherical particles, increase density, enhance purity, and alloy metals. (more information on spherical powders)
The chamber is water-cooled, double wall stainless steel, with an air lock powder collection canister, and a side gas exhaust port. The internal surface of the chamber can be mirror finished.
A heat exchanger located between the powder processing chamber and the filter will cool the gas. The powders are separated from the plasma gas by high efficiency filtration media. An automated blow back system allows the continuous cleaning of the filter and the collection of the fine powder in the bottom canister of the collector unit.
As an option, we can manufacture the inner liner of the reactor in Inconel, or use a protective coating for better resistance to corrosive environments.
In summary:
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High purity process
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Highly polished internal surface
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Efficiency powder collecting device
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Continuous process
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Safety relief pressure device
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Modular section for easy cleaning
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Powder category |
Powder type |
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Ceramics |
Oxide |
SiO2, ZrO2, YSZ, Al2O3, Al2TiO3, glass... |
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Non-oxide |
WC,WC-Co,CaF2,TIN... |
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Pure metals |
Re, Ta, Mo, W, Ti, Si, Nb, Co... |
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Alloys synthesis |
Cf/Fe/C, Re/Mo, Re/W... |
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Property |
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Purity enhancement factor |
up to 10 times |
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Densification factor |
up to 3 times |
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Sheroidization |
up to 100% |
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Melting point |
No limit |
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Raw material type |
Crushed, sponge, fibres, atomized solution |
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Feed rates |
30 kW: 1-4 kg/h
60 kW: 3-8 kg/h
100 kW: 7-16 kg/h
200 kW: 14-32 kg/h |
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