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Induction Plasma Systems

Our induction plasma laboratory units or for industrial production units are available in the following different configurations 

Development Unit (TDU)

Tekna’s induction plasma development units offers considerable flexibility with application in the area of powder treatment, nanopowder synthesis as well as coating and near net-shape deposition. These development units are available in several different configurations, which can be supplied individually or in combination. The modular design permits the reactors to be easily removed from the plasma unit for cleaning and maintenance. This adds flexibility of using dedicated equipments to avoid cross contamination and to assure powder purity. Each system can be either designed with a single or dual RF outlet to minimize reactor manipulation and providing switch over between different processes.

This package permits an exploration of a wide range of plasma operating conditions as well as making quick adjustments to produce several different variations of the material. These units are equipped with user-friendly operating interface allowing close monitoring and archiving the process conditions.

Tekna offers the following two development systems

TDU-30
30 kw induction plasma system suitable for university and lab environment requiring a highly flexible and low automation.
TDU-60
60 kW induction plasma system suitable for pilot production and industrial laboratory requiring flexibility and high level of automation and good control of process conditions.

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Industrial Units (TIU)

Tekna offers production systems with powered levels at 60 kW, 100 kW or 200 kW, which are customized to the each process. Tekna’s industrial systems are made for the demanding environment of the industry. Our systems are specifically designed to meet our customer’s need and incorporate a high level of automation and instrumentation to assure continuous operation 24h/24h.

Tekna offers different level of industrial systems.

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System Configurations

Nanopowder synthesis reactor

Induction plasma can synthesize nanomaterial starting from different precursors either in the powder, liquid, or gaseous state. The high temperature and high heat transfer environment renders it possible to evaporate nearly any material. The controlled and rapid quench give rise to the formation of nano powders in the range of 20-100 nm. (more information process link to Technology/nanopowder)

The powder is evaporated in the induction plasma torch at high temperatures and allowed as it passes through the quench zone to resolidify rapidly. Tekna’s unique quenching zone permits the control of the nanoparticle size and synthesis of highest quality of nanopowders.

The nanopowder synthesis chamber is made of water-cooled, double wall stainless steel construction, with a air lock allowing a continuous withdrawal of the process powder without interruption of the operation of the system. Its internal surface is highly polished for easy cleaning and to deduce all types of contamination and memory effect.

A heat exchanger located between the powder processing chamber and the filter will cool the gas. The powder are separated from the flue gas in nanopowder filtration system and then removed from the system in a removable cup located at the bottom of the unit. The filtration module system can be equipped with a glove box for the safe manipulation of a nanopowder.

In option we can manufacture the inner liner of the reactor in Inconel or corrosive protection coating for better resistance to corrosive environment.
 

In summary:
  • Reactor optimization for the synthesis of high grades nanopowders control particle size
  • Highly polished internal surface
  • High efficiency powder collecting device
  • Safe handling of nanopowders in glove box
  • Modular section for easy cleaning
  • Safety relief pressure device


Type of Material Exemples Typical Mean Diameter Precursor Type
Pure Metals All Metals
(Ag, Al, Cu, Fe, Mo, Ni, Re, Ta, Ti, W ...)
20-75 nm Solid/Gas Phase
Oxides Al2O3, NiO, SiO2, Tio2,ZrO2 ... 50-100 nm Solid/Liquid/Gas Phase
Carbides B4C, SiC, WC ... 40-80 nm Solid/Liquid/Gas Phase
Nitrides TiN, BN, SieN4 ... 20-80 nm Solid/Liquid/Gas Phase
 


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Spheroidization reactor

Induction plasma technology is particularly suited for the powder plasma treatment process because of the large volume of plasma, the axial feeding and the long particle residence time. In-flight melting of individual particles can create spherical particles, increase density, enhance purity, and alloy metals. (more information process link to Technology/spherical powder)

The chamber is made of stainless steel water-cooled, double wall construction, with an air lock powder collection canister, and a side gas exhaust port. The internal surface of the chamber can be mirror finished.

A heat exchanger located between the powder processing chamber and the filter will cool the gas. The powders are separated from the plasma gas by high efficiency filtration media. An automated blow back system allows a continuous cleaning of the filter and the collection of the fine powder at the bottom canister of the collector unit.

In option we can manufacture the inner liner of the reactor in Inconel or corrosive protection coating for better resistance to corrosive environment.
 

In summary:
  • High purity process
  • Highly polished internal surface
  • Efficiency powder collecting device
  • Continuous process
  • Safety relief pressure device
  • Modular section for easy cleaning
Powder category Powder type
Ceramics Oxide SiO2, ZrO2, YSZ, Al2O3, Al2TiO3, glass...
Non-oxide WC,WC-Co,CaF2,TIN...
Pure metals Re, Ta, Mo, W, Ti, Si, Nb, Co...
Alloys synthesis Cf/Fe/C, Re/Mo, Re/W...


Properties Before Plasma Treatment
Purity enhancement factor up to 10 times
Densification factor up to 3 times
Sheroidization up to 100%
Melting point No limit
Raw material type Crushed, sponge, fibres, atomized solution
Feed rates 30 kW: 1-4 kg/h
60 kW: 3-8 kg/h
100 kW: 7-16 kg/h
200 kW: 14-32 kg/h



 

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Coating reactors

Tekna’s plasma spray coating system design is ideal for achieving thin or near-net shape deposition under controlled atmosphere. (more information on process link to Technology/coating)

The vacuum thermal spray coating chamber is water-cooled with a double wall, highly polished, stainless steel interior. The unit is designed to operate with non-corrosive gas. The chamber which is mounted horizontally is to be equipped with a hinged front door, a fixed backdoor, a top opening for the mounting of the RF plasma torch, a bottom port for gas exhaust, and two quartz observation windows.

The unit is equipped with a versatile 3 axis robotized manipulator to move and rotate the substrate below the plasma discharge under positive or vacuum pressure environment:
-    Lateral translation over given stroke at a variable speed.
-    Rotation around its horizontal axis with a variable speed.
-    Vertical translation allowing for the adjustment of the substrate.
 

In summary:
  • High density coating up to 99 %
  • High purity
  • Deposition efficiency up to 90%
  • 3-axis displacement system
  • Highly polished internal surface
  • Overspray powder collection system
  • Safety relief pressure device
  • Supersonic and subsonic coating ability


 

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